Project information
Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
- Project Identification
- GA101/01/1104
- Project Period
- 1/2001 - 1/2003
- Investor / Pogramme / Project type
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Czech Science Foundation
- Standard Projects
- MU Faculty or unit
- Faculty of Science
- Cooperating Organization
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Institute of Scientific Instruments of the ASCR, v. v. i.
- Responsible person Ing. Josef Lazar , Dr.
- Responsible person prof. RNDr. Miloslav Ohlídal, CSc.
The target of the project is a realisation of a laboratory instrument enabling us to measure surface roughness in a non-destructive way in the range from tens of nanometers to tens of micrometers without a priori assumptions concerning a character of the surface. The level of an information content is high (it is possible to determine all-important characteristics of the surface roughness) and it is possible to get results in the real time. The instrument proposed is a laser interference holographic mic roscope of an original construction with a laser light source tuneable in its wavelength (INNOVA Spectrum laser and the semiconductor laser, adapted version of which will be realised by the 2nd joint applicant workplace). In the output plane of the micro scope a hologram of the surface is created. This hologram is through a microobjective recorded by a digital camera. This procedure is performed consecutively with two selected wavelengths. A computer performs a reconstruction of the superposed holograms.
Publications
Total number of publications: 16
2005
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Digital two-wavelength holographic interference microscopy for surface roughness measurement
Proceedings of SPIE 5945, 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, year: 2005
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Optical characterization of double layers containing epitaxial ZnSe and ZnTe films
Journal of Modern Optics, year: 2005, volume: 52, edition: 4
2004
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Atomic Force Microscopy Analysis of Statistical Roughness of GaAs Surfaces Originated by Thermal Oxidation
Microchimica Acta, year: 2004, volume: 147, edition: 3
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Complete Characterization of Rough Polymorphous Silicon Films by Atomic Force Microscopy and the Combined Method of Spectroscopic Ellipsometry and Spectroscopic Reflectometry
Thin Solid Films, year: 2004, volume: 455-456, edition: 1
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Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy
Surface and Interface Analysis, year: 2004, volume: 36, edition: 8
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Influence of the atomic force microscope tip on the multifractal analysis of rough surfaces
Ultramicroscopy, year: 2004, volume: 102, edition: 1
2003
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Aplikace mikroskopie atomové síly při analýze tenkých vrstev ZnSe a ZnTe
Československý časopis pro fyziku, year: 2003, volume: 53, edition: 2
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Atomic force microscopy characterization of ZnTe epitaxial thin films
Japanese Journal of Applied Physics, year: 2003, volume: 42, edition: 7B
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Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry
Proceedings of SPIE, year: 2003, volume: 5182, edition: 2
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New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters
Japanese Journal of Applied Physics, year: 2003, volume: 42, edition: 7B