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Project information
Thermal stability of layered systems studied by high resolution x-ray diffraction and optical reflection of x-rays in situ during annealing

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Project Identification
GA202/98/0569
Project Period
1/1998 - 1/2000
Investor / Pogramme / Project type
Czech Science Foundation
  • Standard Projects
MU Faculty or unit
Faculty of Science

The aim of the project is to study thermal stability of layered systems, interdiffusion, changes of interface roughness and inelastic relaxations using high resolutin x-ray methods during annealing in situ. We will mainly contrate to the very first steps of interdiffusion and relaxation in multilayers Nb/Si and Fe/Si, when these structures start to lose desired electrical parameters (superconductivity, magnetoresistivity). The x-ray measurements will be combined with TEM observation. The results of stru cture analysis will be correlated with electrical measurements (low temperature resistivity for Nb/Si and resistivity in magnetic field for FeSi) and with deposition parameters. Within this project a high temperature chamber will be designed for providin g in situ x-ray measurements in vacuum better then 10-5 torr.

Publications

Total number of publications: 6

2001

2000

1999

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